Model: MMD※0H
This manual valve supports high pressure and high back pressure in chemical liquid lines for semiconductor manufacturing. It must be used fully open or fully closed and cannot be used for flow rate adjustment.
| Working fluid | Chemical liquids, pure water, air, N2 gas |
| Fluid temperature (°C) | 5 to 40 |
| Proof pressure (MPa) | 1.4 |
| Working pressure (A→B) (MPa) | 0 to 0.7 |
| Valve seat leakage (cm3/min) | 0 (water pressure) |
| Back pressure (MPa) | 0 to 0.7 |
| Ambient temperature (°C) | 0 to 40 |
| Mounting orientation | Unrestricted |